RF-PCVD method nano TiO_2 Preparation, Characterization and Photocatalytic Performance
|School||Taiyuan University of Technology|
|Keywords||Frequency plasma chemical vapor deposition CVD Nanoparticles Two photocatalytic titanium Phenol degradation Polymorph control Size Control Molecular Design|
This paper discusses the high-frequency plasma chemical vapor deposition method (RF - PCVD) preparation with titanium dioxide photocatalyst powder technological requirements, puts forward some ways to control the powder particle size and shape, and on the basis of the existing laboratory equipment, in TiCl < sub > 4 < / sub > O < sub > 2 < / sub > system, by controlling the flow rate of carrier gas (Ar) was prepared with different particle size of tio2, characterized by clear of powder for the rutile type and sharp titanium type mixed crystal. In more fully analyzed under the premise of temperature distribution in the reactor, this paper proposed the concept of reaction zone, and preliminarily determines the reaction to the shape and boundary. On this basis, based on collision theory, the reaction process of crystal nucleus collisions happened in the area to grow up, mathematical simulation is carried on the tio2 is obtained by calculation of particle size range between 0.6873 nm - 107.3 nm. In photocatalytic experiment, testing in the lab to produce tio2 photocatalytic activity, known in the photocatalytic efficiency of phenol degradation at German powder 74%.