Dissertation
Dissertation > Industrial Technology > General industrial technology > Materials science and engineering > General issues of engineering materials > Materials Corrosion and Protection

The Anisotropic Etching Simulation of Silicon Based on Cellular Automata Model

Author ZuoLi
Tutor LiJianHua
School East China University of Science and Technology
Course Applied Computer Technology
Keywords anisotropic etching cellular automata model computer simulation OpenGL GPU
CLC TB304
Type Master's thesis
Year 2012
Downloads 40
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The silicon anisotropic etching technology is one of the core technologies in MEMS (Micro-Electro-Mechanical Systems). With the development of the MEMS CAD technology, how to use computer simulate the silicon anisotropic etching has caused wide attention of professionals. The models that the computer usually uses to simulate the silicon anisotropic etching are the geometrical model and the cellular automata model. The simulation of the silicon anisotropic etching that based on geometrical model is simple and intuitive, but it has a poor 3D processing capacity and the results obtained from the simulation is not accurate. So the computer simulation of the silicon anisotropic etching in the paper is based on the cellular automata model, and the etching results can be drawn with OpenGL (Open Graphics Library).The main works of the paper include the following parts:(1) Systematically researched and analyzed the application of the cellular automata model in silicon anisotropic etching simulation, proposed a modeling method that simulates silicon anisotropic etching used the cellular automata model.(2) Against the memory-constrained problem, proposed a new method that can allocate and release the member space dynamically, and it solve the problem of the serious waste and the lack of the memory.(3) Proposed combine the GPGPU (General Purpose Graphics Processing Unit) with the silicon anisotropic etching based on cellular automata, then the computer can shorten the simulation time.The silicon anisotropic etching simulation based on the cellular automata has the advantage of the strong 3D processing capacity and the accurate etching results, by optimizing and improving the simulation, the computer simulation of the silicon anisotropic etching can be more universal and less restrictive.

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