Dissertation > Industrial Technology > Radio electronics, telecommunications technology > Semiconductor technology > General issues > Material > General issues > > Semiconductor thin film technology

ECR-PEMOCVD technique based on a sapphire substrate of a high C -axis preferred Preparation and Characterization of InN films

Author ZhouZhiFeng
Tutor QinFuWen
School Dalian University of Technology
Course Condensed Matter Physics
Keywords InN Plasma enhanced metal organic chemical vapor deposition Sapphire substrate Low temperature deposition
CLC TN304.055
Type Master's thesis
Year 2011
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