Acrylate monomer of ferrous chloride catalyzed atom transfer radical polymerization
|Keywords||ATRP n-Butyl methacrylate PMDETA Iron~ⅡChloride N-substituted maleimide Polyurethane photocuring|
This Paper is divided into two Parts.The first part is focused on the study of Atom Transfer Radical Polymerization（ATRP） of n-butyl methacrylate mediated by FeCl2 catalyst.A new initiator N-butyl-2-bromopropanamide（BBPA） has been designed and synthesized in this article; the kinetics of atom transfer radical polymerization（ATRP） of n-butyl methacrylate （n-BMA） is studied in this paper.Polymerizations of n-BMA have been carried out under the conditions using FeCl2·4H2O/PMDETA catalyst with BBPA used as the initiator in the bulk.Living radical polymerizations of n-BMA have been achieved.The GPC results show that the molecular weights of the polymers are closed to the designed values and the molecular weight distribution（PDI） was narrow throughout the polymerization,such as Wn=17178,PDI=1.16;Wn=45584,PDI=1.18.Plots of ln（[M]0/[M]t） vs.time and molecular weight evolution vs.monomer conversion showed a linear dependence.The dependence of the rate of polymerization and PDI on temperature are presented.At the same time,the PBMA-b-PMMA and PBMA-b-PSt diblock copolymers obtained by ATRP polymerization with PBMA macroinitiators（PBMA,Mn=50913, PDI=1.13;PBMA-b-PMMA,Mn=70616,PDI=1.04;PBMA-b-PSt,Mn=69708, PDI=1.05）.Monomer addition experiments indicated the achieved polymers are "living" polymers.Atom Transfer Radical Polymerization（ATRP） of n-butyl methacrylate is studied in different solvents（toluene and o-xylene）,initiators and monomers.It shows that this system is suitable for methaerylate.The second part is focused on the study of Synthesis of Siliconized Polyurethane Prepolymer and UV-curing.Three N-substituted maleimides（MI） and siliconized polyurethane prepolymer were synthesized and their structures were determined by FT-IR. N-substituted maleimides（MI） were used as photoinitiator to initiate the photocuring of prepolymer,The effects of MI’s concentration and structure on photocuring were studied. The results showed that the resins were photosensitive and the properties of the coating were excellent.